Industrial Partnerships / Photomask Repair

Photomask Repair

Companies manufacturing advanced phase shift masks face significant challenges repairing quartz and molybdenum/silicon (MoSi) defects because current additive repair technologies cannot address these types of repair, causing their customers to discard very expensive masks. NanoInk will play a major role in solving the additive repair problems faced by the semiconductor photomask industry through their proven DPN® process. The company has entered a partnership with a Japanese company, Seiko Instruments Inc. Nanotechnology (SiiNT), to jointly build a tool to inspect and repair photomasks that will revolutionize this industry.
 

See our Press Release:

NanoInk and SII Nanotechnology (SIINT) Announce an Exclusive Licensing and Co-development Agreement for Photomask Repair