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Intellectual Property

Advanced Materials

Electrostatically Driven DPN Patterning

This family of applications describes methods for creating nanoscale patterns via the DPN process by employing surfaces and patterning compounds with opposite electrostatic charges. This method is especially useful for patterning compounds with charged polymeric backbones, including conducting polymers. Conducting polymers are at cutting edge research in photovoltaics and OLEDS.

US 7,102,656 Electrostatically Driven Lithography Granted, September 2006
WO 2004/031072 A2 Electrostatically Driven Lithography Published, April 2004
JP 2005-539400 Electrostatically Driven Lithography Published, December 2005
EP 1509816 A2 Electrostatically Driven Lithography Published, March 2005

 

DPN Patterning of Solid State Materials

This family of applications describes the adaptation of DPN patterning to fabricate solid state structures, especially those comprising inorganic, metal oxide, and sol-gel materials. Technology can be used for photomask repair.

US 2003/0162004 A1 Patterning of Solid State Features by Direct Write Nanolithographic Printing Published, August 2003
TW 2003/05057 Patterning of Solid State Features by Direct Write Nanolithographic Printing Published, October 2003
WO 2003/052514 Patterning of Solid State Features by Direct Write Nanolithographic Printing Published, June 2004
CN 1615457 A Patterning of Solid State Features by Direct Write Nanolithographic Printing Published, May 2005
KR 10-2004-7009448 Patterning of Solid State Features by Direct Write Nanolithographic Printing Published, June 2004
JP 2005-513768 Patterning of Solid State Features by Direct Write Nanolithographic Printing Published, May 2005
CA 2470823 AA Patterning of Solid State Features by Direct Write Nanolithographic Printing Published, June 2003
EP 1502154 A2 Patterning of Solid State Features by Direct Write Nanolithographic Printing Published, February 2005
AU 2364001 AA Patterning of Solid State Features by Direct Write Nanolithographic Printing Published, June 2003

 

DPN Patterning of Sub-50 nm Features

This family describes the use of DPN patterning to fabricate structures with resolutions beneath 50 nanometers. The structures and methods demonstrated include gaps as narrow as 12 nanometers across. Applications include nanoelectrodes and resists.

US 200/0014001 A1 Fabrication of Solid-State Nanostructures including sub-50 Solid-State Nanostructures Based on Nanolithography and Wet Chemical Etching Published, January 2006

 

DPN Patterning of Hard and Soft Magnetic Materials

This family describes an adaptation of DPN patterning to create arrays of hard and soft magnetic materials which are potentially highly useful in a broad array of data storage devices and magnetic sensors. The particular patterning material described in greatest detail is barium ferrite.

US 2004/0142106A1 Patterning Magnetic Nanostructures Published, July 2004
WO 2004/027791A1 Patterning Magnetic Nanostructures Published, April 2004

 

DPN Patterning of Catalyst Materials

This family describes the use of DPN patterning for immobilizing catalyst materials and related compounds on surfaces. These regimes are shown to be primarily useful for growing uniform polymeric structures such as carbon nanotubes.

US 7,098,056 Apparatus, Materials, and Methods for Fabrication and Catalysis Granted, August 2006

 

DPN Patterning of Conductive Materials

This family describes DPN patterning regimes for immobilizing conductive materials on surfaces. These regimes are shown to be primarily useful in the fabrication of micro- and nanoelectronics.

US 7,005,378 Processes for Fabricating Conductive Patterns Using Nanolithography as a Patterning Tool Granted, February 2006
WO 2005/037418 A2 Processes for Fabricating Conductive Patterns Using Nanolithography as a Patterning Tool Published, April 2005

 

DPN Patterning in Support of Site-Specific Polymerization

This family describes DPN patterning regimes for immobilizing catalyst and monomers with nanoscale precision to facilitate the growth of polymers of arbitrary length.

US 2005/0272885 Surface and Site-Specific Polymerization by Direct-Write Nanolithography Published, December 2005
WO 2005/048283 Surface and Site-Specific Polymerization by Direct-Write Nanolithography Published, May 2005

 

Other families of patent portfolio:

  Fundamental Nanolithography

  Bioarrays

  Repair

  Instruments

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